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MAGNETIC THIN FILM PROCESS SOLUTIONS

Magnetic materials, thin film and device researchers & manufacturers working within non-volatile memory, thin film head, sensor, inductor and spintroncs industries utilize a wide variety of process tools for both magnetic and conventional anneal process

UEnanotech presents the following magnetic thin film process solution partner 

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HVM MVAO

Fields ranging from 1.0 to 5.0 Tesla on form factors ranging from  200mm to 300mm wafers. Process temperatures ranging from 150 deg. C. o 600 deg. C. Batches ranging from 50 to 100 wafers. Ideal for NVM, TFH, Inductor and magnetic sensor HVM applications.

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SL-512

5.0 Tesla field on form factors ranging from  200mm to 300mm wafers. Process temperatures ranging from 150 deg. C. o 600 deg. C. Batches ranging from 25 to 50 wafers. Perpendicular & in-plane wafer processing.

Ideal for TFH R&D & production applications

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BL-208 

2.0 Tesla field on form factors ranging from  150 to 200mm. Process temperatures ranging from 150 deg. C. o 600 deg. C. Batches ranging from 12 to 25 wafers.Perpendicular & in-plane wafer processing. Ideal for TFH, NVM and magnetic sensor applications. 

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BL-12

Conventional Anneal w/single wafer magnetizer

For form factors ranging from 150mm to 300mm. Process temperatures ranging from 150 deg. to C. 1000 deg. C. Batches ranging from 50 to 100 wafers.

 Ideal for current/future NVM architectures and TFH applications (w/o) magnetizer

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